GDOES, the Analytical Companion Tool for Magnetron Sputtering Deposition
Magnetron sputtering is a type of Plasma Vapour Deposition. It is somewhat different from general sputtering technology. The difference is that magnetron sputtering technology uses
magnetic fields to keep the plasma in front of the target, intensifying the bombardment of ions. A highly dense plasma is the result of this PVD coating technology.
Pulsed RF GDOES is a companion analytical tool for magnetron sputtering deposition. Magnetron sputtering is a type of Plasma Vapour Deposition. The vacuum chamber of the PVD coating machine is filled with an inert gas, such as argon. By applying a high voltage (RF, HIPIMS etc), a glow discharge is created, resulting in acceleration of ions to the target surface and a plasma coating. The argon-ions will eject sputtering materials from the target surface (sputtering), resulting in a sputtered coating layer on the products in front of the target. Often an additional gas such as nitrogen or acetylene is used, which will react with the ejected material (reactive sputtering). A wide range of sputtered coatings is achievable with this PVD coating technique.
Magnetron sputtering technology is very advantageous for decorative coatings (e.g. Ti, Cr, Zr and Carbon Nitrides), because of its smooth nature. The same advantage makes magnetron sputtering widely used for tribological coating in automotive markets (e.g. CrN, Cr2N and various combinations with Diamond Like Carbon (DLC) coating.
Magnetron sputtering is somewhat different from general sputtering technology. The difference is that magnetron sputtering technology uses magnetic fields to keep the plasma in front of the target, intensifying the bombardment of ions. A highly dense plasma is the result of this PVD coating technology.
