Crystal Defect Analysis

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Reducing defects and precisely controlling impurities have become increasingly important in semiconductor devices for high-speed communication. We will introduce analysis cases illustrating this.

Cathodoluminescence measurement system HORIBA CLUE series

  • Can be added to existing electron microscopes
  • Compatible with measurements at ultraviolet to near-infrared wavelengths (200 to 2,100 nm)
  • SEM integrated high range CL imaging device (Imaging CL) can also be proposed.
Cathodoluminescence - CLUE Series
Cathodoluminescence - CLUE Series

Cathodoluminescence Solutions for Electron Microscopy

F-CLUE
F-CLUE

Compact Hyperspectral Cathodoluminescence

H-CLUE
H-CLUE

Versatile Hyperspectral Cathodoluminescence

R-CLUE
R-CLUE

Raman Photoluminescence & Cathodoluminescence

AFM (atomic force microscope) Raman XploRA Nano

  • Acquire physical information by AFM and chemical information by Raman simultaneously
  • Stress distribution analysis on the outermost surface on the order of nm is possible.
XploRA Nano
XploRA Nano

AFM-Raman for Physical and Chemical imaging

Browse all applications related to Crystal defect analysis

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