Gratings for Synchrotron, FEL and EUV light sources

Holographic Lamellar Gratings

HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.

Holographic recording and ion-etching allows us to tailor the groove shape and distribution to have:

Either constant or Variable Line Spacing (VLS)
Either constant or Variable Groove Depth (VGD).

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Segment: Scientific

Division: Diffraction Gratings for Industrial OEM and Scientific Research

Manufacturing Company: HORIBA France SAS

Features
Specifications

Groove density : up to 4000gr/mm
Dimensions : up to 500mm
Substrate material : silicon, fused silica
Substrate shape : plane, spherical, cylindrical, toroidal
VLS or constant groove density
Efficiency tunability with Variable Groove Depth (VGD)
High quality substrate with slope error ~0.1µrad RMS
Ultra-low grooves roughness : ~0.2nm RMS
Coating : Au, Ni, Pt (other coating on request)

To help us to check the feasibility of your grating, please share the grating specifications :

Substrate material
Substrate size
Useful area
Substrate shape (plane, spherical, …)
Substrate RMS microroughness (nm)
Substrate RMS slope error (µrad or arcsec)
Groove density : constant or VLS
If VLS, N(x) =N0*(1+2*b2x+3*b3x2+4*b4x3+…)

Where :

N0 (mm-1) =

b2 (mm-1) =

b3 (mm-2) =

Groove shape
Energy range
Cff coefficient or angle of incidence
Coating

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Gratings for Synchrotron, FEL and EUV light sources

Holographic Lamellar Gratings

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Gratings

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