Measuring Modes

• Contact AFM in air;
• Contact AFM in liquid (optional);
• Semicontact AFM in air;
• Semicontact AFM in liquid (optional);
• True Non-contact AFM;
• Dynamic Force Microscopy (DFM, FM-AFM);
• Dissipation Force Microscopy;
• Top Mode;
• Phase Imaging;
• Lateral Force Microscopy (LFM);
• Force Modulation;
• Conductive AFM (optional);
• I-Top mode (optional);
• Magnetic Force Microscopy (MFM);
• Kelvin Probe (Surface Potential Microscopy);
• Single-pass Kelvin Probe;
• Capacitance Microscopy (SCM)
• Electric Force Microscopy (EFM);
• Single-pass MFM/EFM (“Plane scan”);
• Force curve measurements;
• Piezo Response Force Microscopy (PFM);
• PFM-Top mode;
• Nanolithography;
• Nanomanipulation;
• STM (optional);
• Photocurrent Mapping (optional);
• Volt-ampere characteristic measurements (optional);
• Shear-force Microscopy with tuning fork (ShFM);
• Normal Force Microscopy with tuning fork.

SmartSPM Scanner and Base

Sample scanning range: 100 µm x 100 µm x 15 µm (±10 %)

Scanning type by sample: XY non-linearity 0.05 %; Z non-linearity 0.05 %

Noise: < 0.1 nm RMS in XY dimension in 200 Hz bandwidth with capacitance sensors on; < 0.02 nm RMS in XY dimension in 100 Hz bandwidth with capacitance sensors off; < 0.04 nm RMS Z capacitance sensor in 1000 Hz bandwidth

Resonance frequency: XY: 7 kHz (unloaded); Z: 15 kHz (unloaded)

X, Y, Z movement: Digital closed loop control for X, Y, Z axes; Motorized Z approach range 18 mm

Sample size: Maximum 40 x 50 mm, 15 mm thickness

Sample positioning: Motorized sample positioning range 5 x 5 mm

Positioning resolution: 1 µm

AFM Head HE001

Laser wavelength: 1300nm;

No registration laser influence on biological sample;

No registration laser influence on photovoltaic measurements.

Registration system noise: <0.03nm.

Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment.

Free access to the probe for additional external manipulators and probes;

Top and side simultaneous optical access: planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 respectively.

AFM Head HE002*

Laser wavelength: 1300nm;

No registration laser influence on biological sample;

No registration laser influence on photovoltaic measurements;

Registration system noise: <0.1nm;

Fully motorized: 4 stepper motors for cantilever and photodiode automated alignment;

Free access to the probe for additional external manipulators and probes;

Top and side simultaneous optical access: with planapochromat objectives, Side objective up to 100x, NA=0.7 Top objective 10x, NA=0.28 simultaneously;

* With HE002 Contact and Semicontact AFM in liquid are impossible.

Optical microscope

Numerical aperture: up to 0.1;

Magnification: on 19" monitor with 1/3" CCD from 85x to 1050x;

Horizontal field of view: from 4.5 to 0.37 mm;

Manual detent zoom: 12.5x (motorized zoom optional);

Stand and coarse/fine focusing unit;

Capability to use planapochromat objectives 10x, NA=0.28 and 20x, NA=0.42 and 100x, NA=0.7 (depends on AFM head);

Liquid cell (optional)

Sample size: 2mm thickness, 25mm diameter;

Sample positioning range: 5x5mm;

Positioning resolution: 1um;

Cell size: 40x40x12mm;

Volume of liquid: 3ml;

Capability of liquid exchange;

Autoclave and ultrasonic cleaning of cell parts.

Liquid cell with temperature control (optional)

Sample size: 2mm thickness, 25mm diameter;

Heating: up to 60°C;

Cooling: below room temperature down to 5°C;

Sample positioning range: 5x5mm;

Positioning resolution: better than 1.5um;

Cell size: 40x40x12mm;

Volume of liquid: 3ml;

Capability of liquid exchange;

Autoclave and ultrasonic cleaning of cell parts.

Conductive AFM unit (optional)

Current range: 100fA ÷ 10uA;

3 current ranges (1nA, 100na and 10uA) switchable from program;

Voltage range: -10 ÷ +7V;

RMS current noise: less than 60fA for 1nA range.

Conductive to Kelvin mode switchable from program.

Combined Shear-force and Normal force tuning fork holder (optional)

Compatible with tuning forks with free resonant frequency 32,768 kHz;

Two types of PCBs for tuning fork fixation for shear-force and normal force operation;

Piezoceramic excitation of tuning fork vibration;

Integrated preamplifier for low noise;

Compatible with 100x side objective for TERS\TEPL measurements;

Compatible with 10x top objective.

Nanoindenter unit (optional)

Maximum load: 5mN.

Load noise floor: less than 100nN.

Displacement noise floor: less than 0.2 nm.

Compatibility with optical systems

No interference with optical imaging due to infrared laser;

Upgradeability to OmegaScope for spectroscopic, photovoltaic, SNOM and TERS & TEPL operation.

Protection enclosure with stand for optical microscope (optional)

Acoustic isolation: 30dB;

Electrostatic shielding;

Inlet and outlet fittings for environmental control connection;

Focusing with micrometer screw ± 6.5mm;

Micrometer reading: 10 um;

Focusing sensitivity: better 1um;

Fast service lift: range up to 98mm;

XY positioning: ± 2mm;

Optional fine focusing for 100x objective:

Fine focusing 0.2mm;

Micrometer reading 0.5 um;

Focusing sensitivity better 0.1um;

Humidity control system (optional)

Relative humidity range: 10-85%;

Relative humidity stability: ±1%;

Software

Automatic alignment of registration system;

Automatic configuration and presetting for standard measuring techniques;

Automatic cantilever resonance frequency adjustment;

Capability to work with force curves;

Macro language Lua for programming user functions, scripts and widgets;

Capability to program controller with DSP macro language in real time without reloading control software;

Capability to process images in coordinate space including making cross-sections, fitting and subtracting of polynomial surface up to 12 degree;

FFT processing with capability to treat images in frequency space including filtration and analysis;

Nanolithography and nanomanipulation;

Processing up to 5000x5000 pixel images.